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Beam shaping technology

Simple as a mirror, powerful as an optical system

We take a high-quality laser mirror and micro-structure it, shaping the beam on reflection. That reflection already sits in your beam path, so the system gains nothing new: one mirror comes out, one mirror goes in.

266–1100 nmCW to 200 fs · up to multi-kWPatented process and product
A Midel beam shaper: a round mirror whose high-reflective coating carries a concentric micro-structure, with the part number engraved on the edge
What it is

A mirror with a micro-structured surface

It sits in the collimated section of your beam path, ahead of the focusing optic. In most systems, it takes the place of a turning mirror that’s already there.

Micro-structuring lets us modulate the phase of the laser light with high precision. Phase is what makes the difference. An aperture or an amplitude mask shapes a beam by blocking what you don’t want, and you pay for those lost photons. A phase element doesn’t remove light: it redirects it. The structure changes the wavefront, and in the focus of the following lens, the light interferes into the target shape. Nothing is blocked, so most of the energy lands on the workpiece instead of a beam dump. The exact share depends on the design; see “Efficiency into the target profile” below.

It converts the incoming beam into whatever profile the process needs: a flat-top, a ring, a set of spots, or a profile that holds stable through depth. Nothing moves. There’s nothing to power, and nothing to control. And because the shaping happens on reflection, the beam never enters a bulk material: no absorption path, no thermal lens to manage.

Side view of the beam path: a collimated Gaussian beam hits a Midel beam shaper set at 45 degrees, leaves it still near-Gaussian because only the phase has changed, passes the focusing optic already in the system, and forms a flat-top in the focus
Where the shape actually appears. The structure on the mirror changes the wavefront, not the intensity, so the profile leaving the optic is still near-Gaussian. The flat-top forms in the focus of the lens you already have. The structure is drawn far coarser than it is, otherwise it would be invisible at this size.

For the optics people: it is a continuous diffractive optical element working in reflection.

Continuous rather than stepped into discrete phase levels, and reflective rather than transmissive. Both follow from how it is made, which is the next section.

Two numbers, kept apart on purpose. The coating returns >99.9 % of the light at the standard NIR, green and UV wavelengths. Efficiency into the target shape is a different figure and we state it per design. What continuous buys you is in the second one: a stepped surface only approximates the target phase, and the approximation error goes into higher orders. With no steps there is no such error.

Micro-delamination

How we make it

Structured light + high-reflective substrate = reflective beam shaper

A high-reflective mirror blank The same mirror after structuring, its surface now carrying a beam-shaping profile A magnified detail of the written micro-structure
01

A fully coated laser mirror

Fused silica, dielectric high-reflective coating.

  • Coatings made in Europe, from suppliers qualified for high-power laser optics
  • High damage thresholds, set by a full dielectric coating and by nothing we add to it
02

Unique direct laser writing

Micro-delamination writes the structure straight into the mirror. No mask, no lithography, no etching, no added layer.

  • No mask and no tooling, so every optic is computed for your target profile and your beam path. Nothing comes out of a catalogue
  • A day of production for a single process step, not months of lead time on a mask or a second coating run
  • The design is a file: there is no minimum quantity, and the same surface comes back unchanged for the next batch
03

An all-reflective beam shaper

Modulation depth around half the working wavelength, and transversal features a few micrometres wide. The mirror now carries your custom beam profile.

How do we manufacture an all-reflective beam shaper this fast? Most people assume we take something off the mirror, or put something on it. Either way, the coating stops being a finished mirror coating: etch or ablate it and you lose reflectivity and power handling right where the beam hits. Cover it, and a second material becomes the optical surface. We do neither. We structure the volume between substrate and coating on a nanometre scale and leave the coating exactly as it is. The optical quality you expect from a high-reflective laser mirror stays put.

Side view of a mirror patterned by subtraction: a smoothly varying amount of the reflective coating has been etched away from the top, so the film stack is opened up
SubtractiveThe route you would expect, and not ours. The pattern is etched or ablated into the coating. Material is taken away, so the layer stack is opened where the structure sits. This would have a negative impact on reflectivity and damage threshold.
Side view of a mirror patterned by addition: the reflective coating stays whole and a polymer of smoothly varying thickness is added on top of it
AdditiveAlso expected, also not ours. The pattern is written on top as a polymer. The coating stays whole, but a second material now forms the optical surface. This would also have a negative impact on reflectivity and damage threshold.
Side view of a Midel mirror patterned by micro-delamination: volume is raised between substrate and coating along a smoothly varying height, and the thin films follow it deformed but unbroken
Our routeMicro-delaminationBetween substrate and HR coating, volume is raised on a nanoscopic scale. It is enough to shape the beam while the full high-reflective coating stays intact, so the optic keeps the reflectivity, damage threshold and lifetime you expect from a high-quality laser mirror. Illustration not to scale.

Micro-delamination is our own direct-write approach. The process and the optic it produces are both patented, granted in all major laser markets across Europe, North America and Asia.

Compatibility

Which lasers it works with

Our beam shapers can be made for a wide range of laser types, currently covering 266 nm to 1100 nm, single mode and multi mode.

The addressed wavelength range from 266 to 1100 nanometres, shown as a spectrum. Standard wavelengths, typically in stock, are 266 nm, 343 and 355 nm, 450 nm, 515 and 532 nm, and 1030 and 1064 nm. Any other wavelength inside the range is on request. 2 micrometres is in preparation, CO2 at 10.6 micrometres is not offered
The range is continuous: any wavelength inside it can be designed for. The marked lines are the ones we hold as standard, so they are the fastest and cheapest route to a first part.
Parameter Envelope
Pulse regime Continuous wave through ultrashort pulse, down to 200 fs
Power Low power up to the multi-kilowatt regime
Beam quality Up to you. M² = 1.0 through highly multi mode, M² > 50
The part

Substrate, coating, format, aperture

What actually arrives, and the envelope it has to fit into: the beam diameter row is usually the one that decides.

Parameter Specification
Substrate Fused silica
Surface Micro-structured dielectric high-reflective coating
Reflectivity >99.9 % at 1064/1032, 532/515 and 355/343 nm · >99.8 % at 266 nm
Standard formats Ø25 mm (1″) and Ø50 mm (2″), round. Other diameters and geometries on request.
Input beam diameter, Ø25 mm (1") Up to 9 mm (1/e²) at 45° angle of incidence. Matched to your beam, ±5 %.
Input beam diameter, Ø50 mm (2") Up to 18 mm (1/e²) at 45° angle of incidence. Matched to your beam, ±5 %. Larger beams on request.
Clear aperture ≥ 2× beam diameter (1/e²) is the optimal condition. We can also adapt the design and optimize for a smaller aperture.
Angle of incidence Designed for a nominal AOI, typically 45°. Tolerance ±1°.
Efficiency into the target profile Design-dependent. For flat-top designs >90 % at 1.5× the Gaussian spot and >95 % at 2–10×. Stated per design.
Power handling

Damage thresholds

Our optics handle very high powers. The laser-induced damage thresholds below were measured and verified with external partners, each under the conditions stated with it.

Regime Threshold and conditions
CW regime
IPG YLS6000-U fiber laser
CW at 1 µm: Up to 30 MW/cm², measured T(30sec)-on-1 to ISO 21254-2 by Lidaris, an independent LIDT testing lab
Ultrashort pulse regime
Light Conversion Pharos SP
180 fs at 343 nm: Up to 235 mJ/cm², measured S(1000)-on-1 to ISO 21254-2 by Lidaris, an independent LIDT testing lab
Short pulse regime
Trumpf TruMicro 8340
Demonstrated in operation at 400 W UV, 343 nm, 18 ns, 40 mJ, in cooperation with the University of Duisburg-Essen, Group of Prof. Barcikowski.
Requirements and limits

What it needs from your system, and what it cannot do

Most are checks, not obstacles; where one is a real go/no-go we say so on the first call. All of them are cheaper to settle now than after the first part is on your bench.

It needs a collimated section

It belongs where the beam runs parallel with a defined diameter, ahead of the focusing optics. No such section, and it’s a design conversation, not a part swap.

Lateral alignment is required

It mounts like a mirror and aligns like an optic. Every element ships with the procedure, and we stay close through your first integration.

One design is one operating point

One wavelength, one input diameter, one target profile, one orientation. Change any of them and it’s a new part, not a setting; two wavelengths in one path means two optics.

The profile is fixed

A passive optic: no actuator, no control loop. If your process has to switch profiles while it runs, this is the wrong technology, and we’ll say so early.

Deflection angles have a ceiling

Direct writing sets how fine the structure gets laterally, and that caps the deflection angle. Where a profile must be far larger than the beam’s natural focus, or spots sit far apart, etched DOEs reach further.

Not all light lands in the shape

Efficiency into the target profile is stated per design. The rest isn’t blocked and isn’t dumped: it stays in the beam, as a low background around the shape.

Next step

What to send us for a fit-check

Four things get you a yes or no. Anything else you have is useful, but not needed to start.

  • The laser: wavelength, CW or pulsed, average power, and pulse energy and duration if pulsed
  • The beam: collimated diameter and how it is defined (1/e², FWHM), plus M² or BPP
  • The optical layout: a sketch is enough. What sits between source and workpiece, focal length, working distance, angle of incidence
  • The profile you want: shape, size, and over what working plane or depth range it has to hold
FAQ

Frequently asked questions

How is this different from a standard etched DOE?
Two things. It is reflective, so the beam never passes through a bulk material. No absorption path, no thermal lensing, which is what makes UV and high average power workable. And the surface profile is continuous rather than stepped into discrete phase levels, which is what the direct-write process allows. Transmissive etched DOEs are not worse across the board: they are easier to mount and can be cheaper at low power. At UV, at high average power and with ultrashort pulses, reflective is the one that holds.
Will it work with my wavelength and laser type?
Very likely. NIR (1030 / 1064 nm), green (515 / 532 nm), blue (450 nm), UV (343 / 355 nm) and DUV (266 nm) are covered as standard, and anywhere in 266–1100 nm is available on request. Single mode through highly multi mode. The full envelope is in Which lasers it works with above. Send your exact wavelength, power and pulse regime, M² and collimated beam diameter, and we’ll confirm fit.
How do I integrate it into an existing machine?
Mechanically, in most systems it takes the place of a turning mirror already in your collimated beam path. Optically it still has to be aligned, and the detail is under Requirements and limits. Every element ships with a manual covering the alignment procedure step by step, and we support you through the first integration. Send us your layout and we’ll confirm what, if anything, changes.
Does the structuring lower the damage threshold?
No. Measured against the unstructured mirror from the same coating run, the structured shaper reached the same threshold: 235 mJ/cm² at 180 fs and 343 nm, S(1000)-on-1 to ISO 21254-2. Figures and conditions are in Damage thresholds above.
Does this scale to a few hundred units a year?
Yes. The optic is designed once against your application spec, then reproduced unchanged at volume. The design is a file, so reproduction is the easy part. Lead time and unit economics are confirmed per program, once the design scope is clear. We’d rather give you a date we can hold than a catalogue figure.

Ready to see if this fits your process?

Send us your laser and the beam profile you’re after. We’ll assess feasibility and confirm fit for your exact configuration.

Discuss your challenge

Outside Germany? See our local partners in the US, Korea and Japan.